Masks for high aspect ratio x-ray lithography
نویسندگان
چکیده
منابع مشابه
Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures
Soft x-ray lithography is a promising micro-nano fabrication process for patterning ultra-precise, low and high aspect ratio microand nanostructures [1-5]. A new negativetone, epoxy-based x-ray resist, mr-X, which offers comparable contrast to PMMA (> 3) at a factor of 20x higher sensitivity, is a promising candidate for this approach [6]. Using a 1 μm thick SiN membrane mask with a ~1 μm thick...
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Hard x-ray nanoimaging enables structural investigations of newmaterials for many applications. For high-resolution experiments, zone plate x-ray optics are commonly chosen. Two methods of zone plate nanofabrication are presented in this thesis. Zone plates are circular diffraction gratings with radially decreasing grating period. Their optical resolution depends on the width of the smallest zo...
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Two advanced processes have been developed for fabricating ultra thick and ultra high aspect ratio (HAR) microstructures. One is the SU-8 based deep x-ray lithography (SU-8 based DXRL) process which uses the normal deep x-ray beam to expose the negative SU-8 resist. Another one is wave length shifter(WLS) based Ultra deep x-ray lithography (WLS-UDXRL) process which uses special ultra deep x-ray...
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A high-aspect-ratio line focus is required on a plane target in x-ray laser experiments for obtaining a high gain-length product. Inherent wave-front aberrations in line-focusing optics, which consist of a cylindrical lens and a spherical lens, are discussed with respect to beam diameter. The nonuniformity of the linewidth that is due to the aberrations is also calculated by the ABCD matrix met...
متن کاملSML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography
A detailed process characterization of SML electron beam resist for high-aspect-ratio nanopatterning at high sensitivity is presented. SML contrast curves were generated for methyl isobutyl ketone (MIBK), MIBK/isopropyl alcohol (IPA) (1:3), IPA/water (7:3), n-amyl acetate, xylene, and xylene/methanol (3:1) developers. Using IPA/water developer, the sensitivity of SML was improved considerably a...
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ژورنال
عنوان ژورنال: Journal of Micromechanics and Microengineering
سال: 1996
ISSN: 0960-1317,1361-6439
DOI: 10.1088/0960-1317/6/2/004